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Copublished with IEE. The dynamic field of lithography demands an authoritative handbook for process development and production and to aid in the training of scientists and engineers. It contains process details, recipes, tables, charts, etc., and is useful as a reference book or as a textbook.
Contents
- Preface
- Introduction
- Optical Lithography
- Electron Beam Lithography
- X-ray Lithography
- Deep-UV Resist Technology
- Photomask fabrication procedures and limitations
- Metrology Methods in Photolithography
- Optical Lithography Modeling
- Issues in Nanolithography for Quantum Effect Device Manufacture
- Index
- Sales Rank: #2479195 in Books
- Brand: Brand: Society of Photo-Optical Instrumentation Engineers
- Published on: 1997-03-14
- Ingredients: Example Ingredients
- Original language: English
- Number of items: 1
- Dimensions: 10.50" h x 7.50" w x 2.00" l, 3.45 pounds
- Binding: Hardcover
- 768 pages
- Used Book in Good Condition
Most helpful customer reviews
0 of 2 people found the following review helpful.
For people interested in advanced lithography
By Shyuan-Fang Chen
The book gives detailed description in electron beam lithography, X-ray lithography, deep-UV resist lithography and photomask fabrication, etc.
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